| 摘要 |
PURPOSE: A resist composition and a resist pattern forming method are provided to improve the lithography characteristic of patterns. CONSTITUTION: A resist composition includes a base component, an acid generating component, and an organic solvent. The base component and the acid generating component are dissolved in the organic solvent. The dissolution of the base component to a developing solution is changed by the action of acid. The acid generating component generates acid by exposure. The organic solvent contains an alcohol-based solvent. The base component contains copolymer with polarity, and the polarity of the copolymer is increased by the action of the acid. A structural unit, derived from acrylic acid ester, containing a lactone-containing cyclic group is uniformly dispersed in the molecule of the copolymer. In the acrylic ester, a hydrogen atom bonded with a carbon atom at theα-position is substitutable with a substituent. |
