| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition excellent in storage stability, sensitivity and solvent resistance and excellent in resolution after a post-baking process that follows a developing process. <P>SOLUTION: The photosensitive resin composition contains: (A) a copolymer having a monomer unit (a1) having a protected carboxyl group protected by an acid decomposable group or a monomer unit having a protected phenolic hydroxyl group protected by an acid decomposable group, and a monomer unit (a2) having a crosslinking group; (B) a photo-acid generator; (C) a methylol-based crosslinking agent having at least one partial structure expressed by the formula in the molecule; and (D) a solvent. In the formula, R<SP POS="POST">1</SP>represents an alkyl group having 1 to 5 carbon atoms, which may be branched. <P>COPYRIGHT: (C)2012,JPO&INPIT |
