发明名称 |
ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME COMPOSITION |
摘要 |
An object of the present invention is to provide an actinic-ray-sensitive or radiation-sensitive resin composition which is significantly excellent in terms of exposure latitude, is capable of forming a favorable rectangular pattern profile, and exhibits low dissolution of the components into an immersion liquid when performing immersion exposure, and a resist film and a pattern forming method each using the same composition. The actinic-ray-sensitive or radiation-sensitive resin composition contains (A) a compound represented by formula (I) and capable of generating an acid upon irradiation of actinic-rays or radiations, and (B) a resin capable of increasing the solubility in an alkaline developer by the action of an acid. |
申请公布号 |
US2012207978(A1) |
申请公布日期 |
2012.08.16 |
申请号 |
US201213369528 |
申请日期 |
2012.02.09 |
申请人 |
SHIBUYA AKINORI;YAMAGUCHI SHUHEI;KODAMA KUNIHIKO;WADA KENJI;MATSUDA TOMOKI;FUJIFILM CORPORATION |
发明人 |
SHIBUYA AKINORI;YAMAGUCHI SHUHEI;KODAMA KUNIHIKO;WADA KENJI;MATSUDA TOMOKI |
分类号 |
G03F7/20;B32B3/30;G03F7/004 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|