| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of preventing airflow stay in substrate transport regions separated from each other and stacked upon another, and facilitating maintenance operation. <P>SOLUTION: The substrate processing apparatus includes a partition board which is disposed at a separating position to separate a first substrate transport region and a second substrate transport region stacked upon another, and has a gas diffusion chamber in the inside thereof; a gas supply passage for supplying gas to a clean gas supply port connected to the gas diffusion chamber of the partition board at a position toward a peripheral edge part from a middle part in a width direction of the substrate transport regions; a filter which is disposed in the gas supply passage and cleans gas supplied to the clean gas supply port; and a large number of discharge ports which are formed in a lower surface of the partition board and discharge gas diffused in the gas diffusion chamber into the substrate transport regions. The partition board constructs the apparatus so as to be retractable from the separating position in order to establish an open state in which the first substrate transport region can be seen through from the second substrate transport region during maintenance. <P>COPYRIGHT: (C)2012,JPO&INPIT |
