发明名称 High-resolution X-ray diffraction measurement with enhanced sensitivity
摘要 A method for analysis includes directing a converging beam of X-rays toward a surface of a sample having an epitaxial layer formed thereon, and sensing the X-rays that are diffracted from the sample while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum including a diffraction peak and fringes due to the epitaxial layer. A characteristic of the fringes is analyzed in order to measure a relaxation of the epitaxial layer.
申请公布号 US8243878(B2) 申请公布日期 2012.08.14
申请号 US20100683436 申请日期 2010.01.07
申请人 YOKHIN BORIS;MAZOR ISAAC;KROHMAL ALEXANDER;GVIRTZMAN AMOS;OPENGANDEN GENNADY;BERMAN DAVID;WORMINGTON MATTHEW;JORDAN VALLEY SEMICONDUCTORS LTD. 发明人 YOKHIN BORIS;MAZOR ISAAC;KROHMAL ALEXANDER;GVIRTZMAN AMOS;OPENGANDEN GENNADY;BERMAN DAVID;WORMINGTON MATTHEW
分类号 G01N23/20;G01N23/203;G01N23/207 主分类号 G01N23/20
代理机构 代理人
主权项
地址