发明名称 |
High-resolution X-ray diffraction measurement with enhanced sensitivity |
摘要 |
A method for analysis includes directing a converging beam of X-rays toward a surface of a sample having an epitaxial layer formed thereon, and sensing the X-rays that are diffracted from the sample while resolving the sensed X-rays as a function of angle so as to generate a diffraction spectrum including a diffraction peak and fringes due to the epitaxial layer. A characteristic of the fringes is analyzed in order to measure a relaxation of the epitaxial layer. |
申请公布号 |
US8243878(B2) |
申请公布日期 |
2012.08.14 |
申请号 |
US20100683436 |
申请日期 |
2010.01.07 |
申请人 |
YOKHIN BORIS;MAZOR ISAAC;KROHMAL ALEXANDER;GVIRTZMAN AMOS;OPENGANDEN GENNADY;BERMAN DAVID;WORMINGTON MATTHEW;JORDAN VALLEY SEMICONDUCTORS LTD. |
发明人 |
YOKHIN BORIS;MAZOR ISAAC;KROHMAL ALEXANDER;GVIRTZMAN AMOS;OPENGANDEN GENNADY;BERMAN DAVID;WORMINGTON MATTHEW |
分类号 |
G01N23/20;G01N23/203;G01N23/207 |
主分类号 |
G01N23/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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