发明名称 SUBSTRATE PROCESSING METHOD
摘要 A substrate processing method includes transferring unprocessed substrates to a first substrate holder by way of lowering a first substrate accommodation unit and loading the unprocessed substrates into a processing chamber in sequence while sequentially rotating a substrate mounting table at a preset angle in one direction, performing a preset process on substrates in a batch-type, and unloading processed substrates from the processing chamber by the first substrate holder after a completion of the preset process, transferring the processed substrates into the first substrate accommodation unit from the first substrate holder by way of raising the first substrate accommodation unit, transferring unprocessed substrates to a second substrate holder by way of lowering a second substrate accommodation unit and loading the unprocessed substrate into the processing chamber in sequence while sequentially rotating the substrate mounting table at the preset angle in the another direction.
申请公布号 US2012201646(A1) 申请公布日期 2012.08.09
申请号 US201213449409 申请日期 2012.04.18
申请人 SAKAUE HIROMITSU;HORIUCHI TAKASHI;TOKYO ELECTRON LIMITED 发明人 SAKAUE HIROMITSU;HORIUCHI TAKASHI
分类号 H01L21/677 主分类号 H01L21/677
代理机构 代理人
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