ROTATING AND HOLDING DEVICE AND TRANSPORT DEVICE FOR SEMICONDUCTOR SUBSTRATE

摘要

[Problem] To provide a holding device for a semiconductor substrate and a transport device for the holding device for the semiconductor substrate such that a high-quality film can be formed on the semiconductor substrate without using a gas wheel method when forming the film in a gas phase state on the semiconductor substrate in a reactor by metal organic chemical vapor deposition, such that opening the reactor and removing and inserting substrates manually are not required, and such that the supply efficiency for gas phase substances supplied to a reactor can be improved. [Solution] A susceptor is secured so as to be attachable and detachable in the vertical direction of a rotating drive shaft, and the susceptor has opening parts formed so as to pass through the susceptor in the direction of thickness. Substrate holders are provided rotatably in the opening parts. Engaging parts are provided underneath the susceptor such that the substrate holders are engaged so as to be vertically disengageable and the substrate holders can be rotated by the rotation of the susceptor.