ELECTROSTATIC CHARGE DISSIPATIVE MATERIALS OBTAINED BY VACUUM DEPOSITION OF MONOMERS AND POLYMERIZATION
摘要
<p>The present invention relates to a process for making electrostatic charge dissipative material comprising the following steps: (a) optionally pretreating a substrate in a plasma field; (b) flash evaporating at least one monomer and at least one hygroscopic additive into a vacuum chamber to produce a vapor; (c) condensing the vapor on the substrate to produce a film of the monomer and the hygroscopic additive coating on the substrate; and (d) curing the monomer of the film to produce a polymeric layer containing hygroscopic additive on the substrate; wherein the condensing step is carried out under vapor-density and residence-time conditions that limit the polymeric layer to a maximum thickness of about 3.0μm. The electrostatic charge dissipative material can be used to protect electrostatic sensitive electronic components.</p>
申请公布号
EP2483471(A2)
申请公布日期
2012.08.08
申请号
EP20100760533
申请日期
2010.09.17
申请人
E. I. DU PONT DE NEMOURS AND COMPANY
发明人
BISBIS, BENYOUSSEF;BLETSOS, IOANNIS, V.;BRABBS, NOEL, STEPHEN