SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING METHOD AND STORAGE MEDIUM

摘要

PURPOSE: A substrate cleaning apparatus, a substrate cleaning method and a storage medium are provided to improve detergency by varying a compressive force of a brush during cleaning. CONSTITUTION: A substrate rotation apparatus rotates a substrate supported by a substrate supporting apparatus. A cleaning-liquid supply apparatus(10) supplies a cleaning liquid to the substrate. A cleaning apparatus(20) includes a brush(21) comprising a sponge-like resin. A brush compressing apparatus compresses the brush. A control part(30) controls the cleaning by varying a compressive force applied to the brush.