发明名称
摘要 PROBLEM TO BE SOLVED: To provide an antistatic photocurable resin composition forming an antistatic film having all of excellent transparency, scratch resistance and higher antistatic property. SOLUTION: The antistatic photocurable resin composition comprises (A) a block copolymer containing at least (a1) a segment composed of a recurring unit having a quaternary ammonium base and (a2) a segment having an organopolysiloxane and (B) a polymerizable compound having two or more ethylenic unsaturated bonds. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP4992356(B2) 申请公布日期 2012.08.08
申请号 JP20060249244 申请日期 2006.09.14
申请人 发明人
分类号 C08J7/04;C08F2/44;C08F293/00;C09D4/00 主分类号 C08J7/04
代理机构 代理人
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