摘要 |
PROBLEM TO BE SOLVED: To provide an antistatic photocurable resin composition forming an antistatic film having all of excellent transparency, scratch resistance and higher antistatic property. SOLUTION: The antistatic photocurable resin composition comprises (A) a block copolymer containing at least (a1) a segment composed of a recurring unit having a quaternary ammonium base and (a2) a segment having an organopolysiloxane and (B) a polymerizable compound having two or more ethylenic unsaturated bonds. COPYRIGHT: (C)2008,JPO&INPIT |