发明名称 |
Photoresist compositions and methods of use in high index immersion lithography |
摘要 |
The present invention relates to a composition comprising a photoresist polymer and a fluoropolymer. In one embodiment, the fluoropolymer comprises a first monomer having a pendant group selected from alicyclic bis-hexafluoroisopropanol and aryl bis-hexafluoroisopropanol and preferably a second monomer selected from fluorinated styrene and fluorinated vinyl ether. The invention composition has improved receding contact angles with high refractive index hydrocarbon fluids used in immersion lithography and, thereby, provides improved performance in immersion lithography. |
申请公布号 |
US8236482(B2) |
申请公布日期 |
2012.08.07 |
申请号 |
US20080163649 |
申请日期 |
2008.06.27 |
申请人 |
ITO HIROSHI;SANDERS DANIEL PAUL;SUNDBERG LINDA KARIN;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
ITO HIROSHI;SANDERS DANIEL PAUL;SUNDBERG LINDA KARIN |
分类号 |
G03C1/00;G03F1/00;G03F7/00 |
主分类号 |
G03C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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