| 摘要 |
PURPOSE: A substrate treating method is provided to quickly form and stably maintain a high vacuum state in a standby state. CONSTITUTION: First reference pressure is formed in a chamber by initial pumping inside the chamber(S300). Second reference pressures is formed in the chamber by pumping inside the chamber(S400). A substrate treating process is performed in the chamber while maintaining the second reference pressure(S500). The state of the chamber is changed into the atmosphere state after the substrate treating process(S600). |
