发明名称 |
Substrate processing apparatus and substrate processing method |
摘要 |
Provided are a substrate processing apparatus and a substrate processing method capable of processing of a substrate using a supercritical fluid without exposing the pattern formed on the substrate to an atmospheric environment. The substrate processing apparatus includes a cleaning bath configured to accommodate a substrate and clean the substrate by flowing a cleaning solution, and a processing vessel configured to accommodate the cleaning bath and process the substrate with a supercritical fluid.
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申请公布号 |
US8235061(B2) |
申请公布日期 |
2012.08.07 |
申请号 |
US20100824565 |
申请日期 |
2010.06.28 |
申请人 |
TOSHIMA TAKAYUKI;TERADA KAZUO;HONDA KAZUYUKI;TOKYO ELECTRON LIMITED |
发明人 |
TOSHIMA TAKAYUKI;TERADA KAZUO;HONDA KAZUYUKI |
分类号 |
B08B3/08;B08B3/10 |
主分类号 |
B08B3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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