| 发明名称 |
Etchant and array substrate having copper lines etched by the etchant |
| 摘要 |
An etchant includes hydrogen peroxide (H2O2), and a mixed solution including at least one of an organic acid, an inorganic acid, and a neutral salt. |
| 申请公布号 |
US8236704(B2) |
申请公布日期 |
2012.08.07 |
| 申请号 |
US20090654494 |
申请日期 |
2009.12.22 |
| 申请人 |
JO GYOO-CHUL;CHAE KI-SUNG;LG DISPLAY CO., LTD. |
发明人 |
JO GYOO-CHUL;CHAE KI-SUNG |
| 分类号 |
G02F1/1343;H01L21/302;C09K13/04;C09K13/06;C23F1/18;C23F1/26;G02F1/1368;H01L21/28;H01L21/306;H01L21/3213;H01L21/336;H01L29/45;H01L29/786 |
主分类号 |
G02F1/1343 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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