| 摘要 |
PURPOSE: A chamber and a substrate processing apparatus having the same are provided to prevent a substrate from being contaminated or damaged in a substrate processing process by eliminating foreign materials from the chamber. CONSTITUTION: A chamber(10) includes a chamber body including an upper body(11) and a lower body(13). A foreign material suction apparatus(100) is included in a coupling portion(3) of the lower body and the upper body. A guide(110) induces foreign materials generated in the coupling portion to an outlet hole(13a). A sealing portion(130) seals a gap between the outlet hole and the outside of the chamber. A suction line(150) is connected to one side of the sealing portion.
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