发明名称 EXPOSURE DEVICE AND EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To form a plurality of different orientation regions on an oriented film on a single substrate without using a mask. <P>SOLUTION: A substrate (1) is scanned by a linearly polarized light beam radiated obliquely from a light beam radiation device (20) so as to provide an oriented film applied to the substrate, with orientation characteristics arranging the orientation direction of liquid crystals. The light beam radiation device is provided with a plurality of illumination optical systems that supply a spatial light modulator (25) with light beams each having a different angle of incidence. The light beams having different angles of incidence supplied from the respective illumination optical systems are modulated by the spatial light modulator respectively, and the plurality of light beams having different incident angles are radiated from radiation optical systems (26a and 26b) to the substrate supported on a chuck. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012145899(A) 申请公布日期 2012.08.02
申请号 JP20110006334 申请日期 2011.01.14
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 NEMOTO RYOJI;KATAOKA FUMIO;UEHARA SATOSHI;KAMAISHI KOSEI;HATAKEYAMA MICHIKO
分类号 G03F7/20;G02F1/13;G02F1/1337 主分类号 G03F7/20
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