| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an oxide sintered compact target allowing stable discharge, and a transparent conductive film having low resistance and having high transmittance in a wide range from a visible light region to a near-infrared region. <P>SOLUTION: Film deposition is performed by a sputtering method using a sputtering target formed of a multiple oxide sintered compact comprising zinc, an element L (L is aluminum and/or gallium), scandium and oxygen, wherein the atomic ratio of L/(zinc+L+scandium) is 0.001-0.100 and the atomic ratio of scandium/(zinc+L+scandium) is 0.001-0.100, to obtain the objective transparent conductive film in which the atomic ratio of L/(zinc+L+scandium) is 0.002-0.100 and the atomic ratio of scandium/(zinc+L+scandium) is 0.002-0.100. The film is used as a light receiving element. <P>COPYRIGHT: (C)2012,JPO&INPIT |
