发明名称 COATING FILM REMOVING METHOD, AND APPARATUS THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To provide a coating film removing method and an apparatus thereof by which the removal accuracy of the coating film is improved, the removal time of the coating film is shortened and the quantity of a solvent to be used is reduced. <P>SOLUTION: The coating film removing method is carried out by moving a coating film removing part from one end to another end of a substrate along a prescribed width of the side edge of the substrate while discharging a solvent and an inert gas from the end part of the surface of the substrate by a solvent discharge part and an inert gas discharge part (a removing step S-1), detecting the concentration of a solvent and a dissolved material in a mixed waste liquid of the solvent with the dissolved material discharged from a discharge path by a concentration measuring part (a concentration detecting step S-2), discriminating the presence of the dissolved material in the mixed waste liquid which is detected by the concentration measuring part (a concentration discriminating step S-3), and changing and establishing a removal condition of the coating film on the basis of the detected concentration valued of the dissolved material by the concentration measuring part (a removal condition modification step S-6). In the concentration discriminating step for the dissolved material, the coating film removing step is continued until it is confirmed that the dissolved material is not present in the mixed waste liquid and after the confirmation of the absence of the dissolved material, the coating material removal is carried out under the modified and established removal condition. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012143704(A) 申请公布日期 2012.08.02
申请号 JP20110003746 申请日期 2011.01.12
申请人 TOKYO ELECTRON LTD 发明人 HASEBE KAZUHISA
分类号 B05D3/12;B05C9/12;G03F7/16;H01L21/027 主分类号 B05D3/12
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