CHAMBER APPARATUS

摘要

PROBLEM TO BE SOLVED: To suppress deterioration in characteristics and performance of an element arranged within a chamber in a chamber apparatus.

SOLUTION: A chamber apparatus is used together with a laser system and a focusing optical system for focusing a laser beam output from the laser system. The chamber apparatus may include: a chamber having an inlet through which the laser beam is introduced into an inside of the chamber; a target supply system mounted to the chamber and supplying a target material to a predetermined region in the chamber; and a collection part arranged in the chamber for collecting a charged particle generated when the target material is irradiated with the laser beam in the chamber.

COPYRIGHT: (C)2012,JPO&INPIT