| 摘要 |
<P>PROBLEM TO BE SOLVED: To increase a degree of vacuum and cleanliness in a plasma generating chamber by a simple structure in a LPP type EUV light source device. <P>SOLUTION: An extreme ultraviolet light source device includes: a droplet generating chamber 100; a plasma generating chamber 110 connected to the droplet generating chamber via an opening part 101a; a nozzle 102 for supplying a target material to an inside of the plasma generating chamber; a piezo element 103 and a piezo driver 106 for generating droplets 108 of a molten metal which repeatedly drop based on the target material of the molten metal supplied from the nozzle; a droplet interrupting unit 107 for preventing a generated droplet 108a of the target material from passing the opening part; a control part 115 for controlling the droplet interrupting unit so as to operate in a prescribed timing; a laser light source 111 which emits laser light; and a lens 112 used to irradiate, with the laser light emitted from the laser light source, a droplet 108b of the target material generated in the droplet generating chamber and introduced into the plasma generating chamber through the opening part. <P>COPYRIGHT: (C)2012,JPO&INPIT |
