METAL PATTERN FORMING METHOD FOR FORMING METAL PATTERN ON SUBSTRATE AND SUBSTRATE MANUFACTURED BY THE SAME

摘要

PURPOSE: A method for forming a metal pattern on a substrate and the substrate manufactured by the same are provided to reduce manufacturing costs and time by removing an etching process. CONSTITUTION: An upper surface of a substrate(10) is processed by an RIE(Reactive Ion Etching). A mask pattern(11) is formed on the processed upper surface of the substrate. A metal thin film layer(12a,12b) is formed on the upper surface of the mask pattern. The metal thin film layer is removed from the upper surface of the mask pattern.