发明名称 POLISHED OBJECT HOLDING MATERIAL, POLISHING APPARATUS, AND METHOD FOR POLISHING POLISHED OBJECT
摘要 <P>PROBLEM TO BE SOLVED: To provide an economically advantageous polished object holding material shortened in a dressing time for the polished object holding material, suppressed in scratch to the polished object, and improved in warp precision in a thin substrate, substrate thickness precision, and lifetime. <P>SOLUTION: The polished object holding material is formed by joining one layer of a liquid crystal polymer film to both sides including a base layer of a plate-like material 4 of one of a metal plate, a fiber-reinforced plastic plate, and a plastic plate via a thermosetting adhesive, or the polished is formed by stacking one layer of a liquid crystal polymer film on both sides of a glass long fiber base material 2 (prepreg) in which a plurality of thermosetting resins is impregnated. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012139803(A) 申请公布日期 2012.07.26
申请号 JP20110000857 申请日期 2011.01.05
申请人 KYOCERA CHEMICAL CORP 发明人 OHORI KAZUHIKO;FUKUKAWA HIROSHI
分类号 B24B37/28;H01L21/304 主分类号 B24B37/28
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