| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography system capable of suppressing transmission of vibration to certain lithography apparatus from peripheral devices, in a cluster configuration including a lithography apparatus. <P>SOLUTION: In the lithography system 20, a control means 23 controls a first vibration isolation means 25A included in a first lithography apparatus 25A based on the drive indication information 34a, 34b to second moving bodies 27B, 27C in at least one second lithography apparatuses 22B, 22C excepting a first lithography apparatus 22A including a first vibration isolation object 26A out of a lithography apparatus 22, and the control indices 32a, 32b of vibration generated in the first vibration isolation object 26A due to moving operation of the second moving bodies 27B, 27C. <P>COPYRIGHT: (C)2012,JPO&INPIT |
