发明名称 EXPOSURE DEVICE AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide an advantageous technique for withdrawal of liquid at a withdrawing port. <P>SOLUTION: An exposure device which has a projection optical system and exposes a substrate to light through the projection optical system and liquid has plural withdrawing ports for withdrawing the liquid supplied between the projection optical system and the substrate, a chamber connected to the plural withdrawing ports, and a pump for sucking the liquid through the plural withdrawing ports and the chamber. The plural withdrawing ports are arrayed discretely between the apexes of respective sides of a polygon and on the respective apexes, and the differential pressure between the withdrawing port at each apex out of the plural withdrawing ports and the pump is smaller than the differential pressure between the withdrawing port between the apexes at the sides out of the plural withdrawing ports and the pump. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012142461(A) 申请公布日期 2012.07.26
申请号 JP20110000003 申请日期 2011.01.01
申请人 CANON INC 发明人 SAKAI KEITA;HAYASHI TATSUYA;HASEGAWA TAKAYASU
分类号 H01L21/027 主分类号 H01L21/027
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