| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition and a method for forming a resist pattern using the resist composition. <P>SOLUTION: The resist composition contains a base component (A) the solubility of which with a developing solution changes by an action of an acid, an acid generator component (B) generating an acid by exposure, and a nitrogen-containing organic compound component (D). The acid generator component (B) contains an acid generator (B1) comprising a compound expressed by general formula (b1-1). The nitrogen-containing organic compound component (D) contains a compound (D1) expressed by general formula (d1). <P>COPYRIGHT: (C)2012,JPO&INPIT |
