发明名称 |
ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING A PATTERN USING THE SAME |
摘要 |
<p>According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin containing a repeating unit (A) containing both a structural moiety (S1) that is decomposed by an action of an acid to thereby generate an alkali-soluble group and a structural moiety (S2) that is decomposed by an action of an alkali developer to thereby increase its rate of dissolution into the alkali developer, and a compound that generates an acid when exposed to actinic rays or radiation.</p> |
申请公布号 |
EP2478415(A1) |
申请公布日期 |
2012.07.25 |
申请号 |
EP20100817324 |
申请日期 |
2010.09.16 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
IIZUKA, YUSUKE;TAKAHASHI, HIDENORI;SHIRAKAWA, MICHIHIRO;YOSHIDOME, MASAHIRO;HIRANO, SHUJI |
分类号 |
G03F7/039;C08F220/26;G03F7/004;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|