发明名称 APPARATUS FOR SURFACE TEXTURING OF WAFER FOR SOLAR CELL WITH IMPROVING ETCHING UNIFORMITY
摘要 <p>PURPOSE: Apparatus for surface texturing of a wafer for solar cells with creasing etching uniformity is provided to increase light absorption efficiency of a solar cell by forming an identical pyramid structure across the wafer surface. CONSTITUTION: A wafer(101) is loaded on a susceptor(112) located on inside of a chamber(110). A main gas dispenser(120) sprays etching gases from the upper to the lower inside the chamber. A side gas dispenser(130) located on the side of the chamber sprays etching gases into the chamber. An etching gas provider(140) including an etching gas storage unit(142) containing etching gases supplies etching gases to the main and side gas dispensers.</p>
申请公布号 KR20120083071(A) 申请公布日期 2012.07.25
申请号 KR20110004511 申请日期 2011.01.17
申请人 SEMIMATERIALS. CO., LTD.;PARK, KUN 发明人 PARK, KUN JOO;KIM, YONG GAB;KIM, GI HONG;PARK, KUN
分类号 H01L31/18;H01L21/3065;H01L31/0236;H01L31/04 主分类号 H01L31/18
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