| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus and a method for cleaning a transparent substrate for a color filter, the apparatus and the method having improved irradiation efficiency of UV light. SOLUTION: The apparatus for cleaning the transparent substrate for the color filter is equipped with a transfer means to transfer the transparent substrate for the color filter to a UV light irradiated region and a UV light irradiation means with a UV light source and a UV light irradiation window provided thereon, wherein the transfer means has a plurality of gas blast nozzles, makes the transparent substrate for the color filter float by blasting a gas from the gas blast nozzles, and holds a gap between the UV light irradiation window and the transparent substrate for the color filter to be equal to or less than a predetermined distance, and the surface of the transparent substrate for the color filter transferred to the UV light irradiated region is irradiated with the UV light by the UV light irradiation means and is cleaned. COPYRIGHT: (C)2008,JPO&INPIT |
