发明名称 |
PREPARATION METHOD OF APPARATUS FOR RECEIVING WAFER |
摘要 |
PURPOSE: A method for manufacturing a wafer holding device is provided to prevent the damage of a wafer in beforehand due to the reduction of adsorptive power by minutely forming a vacuum hole for adsorbing the wafer. CONSTITUTION: A settling unit(100) is composed of a chuck(110) and a supporting board(120). The supporting board is composed of a supporting board body(121), an external periphery projection(122), a center recess(123), and a settling projection(125). A vacuum offering hole(121a) passing through the center portion of the supporting board body. A guide groove(124) is formed at the corner of the center recess. An installation body(210) is composed of a first installation body(211) and a second installation body(212) connected with an external vacuum pump(220).
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申请公布号 |
KR101167692(B1) |
申请公布日期 |
2012.07.20 |
申请号 |
KR20110082153 |
申请日期 |
2011.08.18 |
申请人 |
BT&IT SOLUTIONS CO., LTD. |
发明人 |
JO, JAE SEUNG;KIM, JUNG HO;YOO, SEUNG MIN;YOON, HYE JIN;YUK, NA RA |
分类号 |
H01L21/683;B23Q3/08;H01L21/687 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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