发明名称 GAS FEEDING ASSEMBLY FOR SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING APPARATUS HAVING THE SAME
摘要 PURPOSE: Gas supply assembly and a substrate processing apparatus including the same are provided to prevent the substrate processing apparatus to be contaminated by preventing the leakage of gas in the gas supply line. CONSTITUTION: A gas supply unit is installed at the upper side of a processing space. A gas supply pipe(191) is connected with a gas supply device and supplies gas to the gas supply unit. A gas supply pipe unit(190) comprises an exhaust pipe exhausting the gas leaked from the gas supply pipe. The gas supply pipe unit is divided into a first gas supply pipe unit and a second gas supply pipe unit. The first gas supply pipe unit and the second gas supply pipe unit are detachably connected with each other through gas supply assembly.
申请公布号 KR20120081747(A) 申请公布日期 2012.07.20
申请号 KR20110003044 申请日期 2011.01.12
申请人 WONIK IPS CO., LTD. 发明人 JO, JUN HEE
分类号 H01L21/3065;H01L21/205 主分类号 H01L21/3065
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