METHOD OF FORMING PHOTOMASK USING CALIBRATION PATTERN, AND PHOTOMASK HAVING CALIBRATION PATTERN

摘要

PURPOSE: A photo-mask and a method for manufacturing the same are provided to precisely produce an MTT(Mean-To-Target) dimension and uniformity of a two-dimensional pattern at the same time by accurately transferring a desire pattern on a substrate. CONSTITUTION: One-dimensional calibration measured patterns are obtained from one-dimensional calibration design patterns and two-dimensional calibration measured patterns are obtained from two-dimensional calibration design patterns(S20). First measured dimensions of the one-dimensional calibration measured patterns are obtained and second measured dimensions of the two-dimensional calibration measured patterns are obtained(S30). A correlation between the first measured dimensions and the second measured dimensions is established(S40). A main measured dimension of a main pattern is changed into the first measured dimension by using the correlation(S50).