| 摘要 |
<p>PURPOSE: A photo mask and a method for manufacturing the same are provided to secure phase shift film materials for a wet etching operation in case of manufacturing a flat panel display(FPD) device. CONSTITUTION: A photo mask for manufacturing a FPD device includes a blind region(50) and a main region(60). A light shielding region(102) and a light transmitting region(104) are arranged in the blind region. A phase shirting region(106) and the light transmitting region are arranged in the main region. The blind region is formed by stacking a metal film pattern and a phase shift film(30) on a transparent substrate(10). The transparent substrate, exposed by successively etching the phase shift film and the metal film pattern, is included in the light transmitting region of the blind region. The transparent substrate, exposed by etching the phase shift film, is included in the light transmitting region of the main region.</p> |
