发明名称 DEVICE FOR PROCESSING SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To evaluate deterioration and settling of the elasticity of a power feeding member to which a voltage is applied from a voltage application device. <P>SOLUTION: A device for processing a substrate includes: a chamber 85 with a carry-in opening and a carry-out opening; a gas feeding device 12 for feeding a gas into the chamber; a plasma generating device for converting the gas into plasma; a substrate holder 20 for holding the substrate; a carrier 2 that is carried from the carry-in opening to carry the substrate holder to the carry-out opening, while holding the substrate holder; the voltage application device 16 for applying a voltage to the substrate holder 20; a driving device 18 that operates the power feeding member 13 so as to bring the power feeding member into contact with or detach from the substrate holder 20 to feed the voltage from the voltage application device 16; and a current measurement device 17 for measuring a current flowing through the power feeding member 13. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012136758(A) 申请公布日期 2012.07.19
申请号 JP20100291271 申请日期 2010.12.27
申请人 CANON ANELVA CORP 发明人 SAHASE HAJIME
分类号 C23C16/54;C23C16/50;G11B5/851;H01L21/205;H01L21/677 主分类号 C23C16/54
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