发明名称 HV Interconnection Solution Using Floating Conductors
摘要 A device includes a first and a second heavily doped region in a semiconductor substrate. An insulation region has at least a portion in the semiconductor substrate, wherein the insulation region is adjacent to the first and the second heavily doped regions. A gate dielectric is formed over the semiconductor substrate and having a portion over a portion of the insulation region. A gate is formed over the gate dielectric. A floating conductor is over and vertically overlapping the insulation region. A metal line includes a portion over and vertically overlapping the floating conductor, wherein the metal line is coupled to, and carries a voltage of, the second heavily doped region.
申请公布号 US2012181629(A1) 申请公布日期 2012.07.19
申请号 US201113007220 申请日期 2011.01.14
申请人 SU RU-YI;YANG FU-CHIH;TSAI CHUN-LIN;HUO KER HSIAO;CHENG CHIH-CHANG;LIU RUEY-HSIN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 SU RU-YI;YANG FU-CHIH;TSAI CHUN-LIN;HUO KER HSIAO;CHENG CHIH-CHANG;LIU RUEY-HSIN
分类号 H01L29/78 主分类号 H01L29/78
代理机构 代理人
主权项
地址