发明名称 METHOD FOR SELECTIVELY METALLIZING A SUBSTRATE AND INTERCONNECT DEVICE PRODUCED BY THIS METHOD
摘要 A method for selectively metallizing a substrate having a significant content of a plastics material includes ablating a layer of the substrate close to a surface of the substrate in a region of the substrate to be metallized so as to provide access to an additive having at least one compound from a substance family of aluminosilicates that is incorporated in the plastics material and to open one of a pore or a pore structure of the aluminosilicates in the region of the substrate to be metallized. The substrate is metallized with no external current starting inside the pore or the pore structure so as to incorporate a precious metal in the substrate and then at an outer edge region of the pores so as to form a planar metallization layer on the surface of the substrate
申请公布号 US2012183793(A1) 申请公布日期 2012.07.19
申请号 US201213350871 申请日期 2012.01.16
申请人 JOHN WOLFGANG;ROESENER BERND;LPKF LASER & ELECTRONICS AG 发明人 JOHN WOLFGANG;ROESENER BERND
分类号 B05D3/06;B05D3/12;B32B15/08 主分类号 B05D3/06
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