| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a chemically amplified positive type photoresist composition for thick films capable of forming a thick-film resist pattern having high resolution and dimension controllability, and having favorable rectangularity, and to provide a production method of a thick-film resist pattern using such composition. <P>SOLUTION: The photoresist composition comprises an acid generator (A) including a cationic moiety represented by a general formula (a1) and an anionic moiety represented by a general formula (a2), and a resin (B) whose alkali solubility increases by the action of an acid. R<SP POS="POST">1a</SP>to R<SP POS="POST">3a</SP>each independently represents an alkoxy group, an alkyl carbonyl group, an alkyl carbonyloxy group, an alkyl oxycarbonyl group or the like. <P>COPYRIGHT: (C)2012,JPO&INPIT |
