| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a reforming device capable of efficiently absorbing substances generated during the plasma discharge and significantly reducing the leakage of the substances. <P>SOLUTION: A reforming device 100 for reforming a surface to be processed with plasma comprises conveying means 79 for conveying a sheet-like workpiece S in a predetermined direction and a counter electrode part 85 having a discharge electrode roller 84 which is arranged in contact with the surface to be processed of the workpiece S to generate plasma to the surface to be processed and a counter electrode 80. The reforming device 100 has a cover member 61 comprising a duct part 61a connected to suction means which covers the counter electrode part 85 and sucks air and an inflow port through which air flows during the operation of the suction means, and the cover member 61 is formed to have a shape so that no turbulence of air is generated near the inflow port inside the cover member 61 during the operation of the suction means. <P>COPYRIGHT: (C)2012,JPO&INPIT |
