DEVICE FOR DEPOSITING MOLECULAR RESIST COMPOSED OF LOW-MOLECULAR-WEIGHT COMPOUND

摘要

A substrate-processing system for forming a resist pattern from a molecular resist composed of a low-molecular-weight compound on a substrate comprises a film formation device for forming a resist film on the substrate, an exposure device for exposing the formed resist film, and a developing device for developing the exposed resist film. The film formation device has: a processing container for accommodating the substrate; a holding platform for holding the substrate, the platform being disposed in the processing container; a resist film deposition head for feeding the vaporized molecular resist to the substrate held on the holding platform; and a pressure reduction mechanism for reducing the ambient pressure in the processing container to a vacuum atmosphere.