CHEMICAL VAPOR DEPOSITION APPARATUS AND METHOD OF FORMING SEMICONDUCTOR SUPERLATTICE STRUCTURE USING THE SAME

摘要

PURPOSE: A chemical vapor deposition apparatus and a manufacturing method of a semiconductor superlattice structure using the same are provided to improve mechanical stability by unifying a gas supply unit. CONSTITUTION: A wafer holder(20) is formed in the inner pipe of a reaction chamber(10). A gas supply unit(30) includes a stem pipe(31), a branch pipe(32) and a spray nozzle(33). The stem pipe is formed on the outer side of the reaction chamber. Each branch pipe is connected to the stem pipe. The spray nozzle sprays a reaction gas to a plurality of wafers.