| 摘要 |
<p>A method of producing a film 1 that is suitable for use as a plasmon-active electrode in an organic photovoltaic device 10 is described. The method comprises forming on a substrate 3 at least one binding layer 2, depositing a metallic layer 4 that binds to the binding layer 3, and heating the metallic layer 4 so as to produce therein a plurality of apertures or voids 5, each having a diameter of less than 300 nm, wherein the metallic layer after the heating has a sheet resistance of no more than twice the metallic layer before the heating. The apertures can be arranged randomly and have a large variation in diameter.</p> |
