SUBSTRATE PROCESSING APPARATUS

摘要

PURPOSE: A substrate processing apparatus is provided to improve drying efficiency by forming a vane on a spin head. CONSTITUTION: A substrate supporting unit includes a spin head(210) on which a substrate is placed. A processing container collects distributed processing liquid on the substrate while being installed in order to surround around the spin head. A movement nozzle unit sprays the processing liquid while having swing rotation. A spin head includes support pins(212) and chucking pins(214) chucking the edge of the substrate. Either the support pin or the chucking pin includes a vane(213) for generating an air current in the washing and drying of the spin head and the processing container.