发明名称 |
MEMBER FOR SUPPORTING SUBSTRATE, APPARATUS FOR TREATING SUBSTRATE WITH THE MEMBER AND METHOD FOR TREATING SUBSTRATE |
摘要 |
PURPOSE: A substrate support member, a substrate processing apparatus having the same, and a substrate processing method are provided to minimize a substrate to be loaded in a groove as the tilted state. CONSTITUTION: A substrate support member(100) supports a substrate(W) within a chamber(10). The substrate support member comprises a susceptor(110) and a spraying member(150). The spraying member comprises a nozzle(155) spraying purge gas to a plurality of seating grooves. The nozzle is installed on a body. The plurality of seating grooves surrounds the body. A gas supply member(200) supplies process gas to the substrate. An exhaust member(300) exhausts the process gas to outside. A heater(400) is installed at the lower side of the susceptor.
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申请公布号 |
KR20120076077(A) |
申请公布日期 |
2012.07.09 |
申请号 |
KR20100138066 |
申请日期 |
2010.12.29 |
申请人 |
SEMES CO., LTD. |
发明人 |
JUNG, KYUNG HWA;MOON, HYEON CHEOL;LEE, JANG HEE |
分类号 |
H01L21/205;C23C16/44;C23C16/458;H01L21/683 |
主分类号 |
H01L21/205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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