发明名称 EXPOSURE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide an exposure apparatus in which an installation floor space of the exposure apparatus can be made smaller. <P>SOLUTION: The exposure apparatus comprises: an optical engine 31; a first Y table 20R that is freely movable on a first X table 5R in Y direction by a linear guiding device 9R including a track 9Rb and a bearing 9Ra; a first XY table R, in which the bearing 9Ra supports less than 1/2 of the length of the first Y table 20R in Y direction; and a second XY table L which is arranged on the left side in Y direction of the optical engine 31 and whose configuration is symmetrical to the first XY table R with respect to a symmetrical surface P perpendicular to Y direction of the optical engine. A substantial support end (end surface 9Ra1f), which supports the first Y table 20R or the second Y table 20 L when the first Y table 20R or the second Y table 20 L is positioned at an exposure position, is arranged at 10 mm or less from the symmetrical surface P. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012128039(A) 申请公布日期 2012.07.05
申请号 JP20100277517 申请日期 2010.12.13
申请人 HITACHI VIA MECHANICS LTD 发明人 IWATA TSUTOMU
分类号 G03F7/20;H01L21/027 主分类号 G03F7/20
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