发明名称 LIQUID PROCESSING APPARATUS, LIQUID PROCESSING METHOD AND RECORDING MEDIUM HAVING PROGRAM FOR EXECUTING LIQUID PROCESSING METHOD RECORDED THEREIN
摘要 PURPOSE: An apparatus and method for processing a liquid, and a recording medium for performing a program thereof are provided to reducing process time by preventing treatment solution from remaining on a substrate. CONSTITUTION: A substrate holding unit(40) holds a substrate. A treatment solution supply unit(70) supplies treatment solution to the substrate held by the substrate holding unit. A rinsing liquid supply unit(80) supplies rising liquid to the substrate. A light emitting element(112) emits light to a surface of the substrate. A control unit(200) controls the substrate holding unit, the treatment solution apply unit, the rinsing liquid supply unit and the light emitting unit.
申请公布号 KR20120074198(A) 申请公布日期 2012.07.05
申请号 KR20110109178 申请日期 2011.10.25
申请人 TOKYO ELECTRON LIMITED 发明人 KASAI SHIGERU;SUZUKI AYUTA;SAWADA IKUO;SHINDO NAOKI;YONEDA MASATAKE;OOYA KAZUHIRO
分类号 H01L21/302 主分类号 H01L21/302
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