| 摘要 |
The purpose of the present invention is to provide a method for manufacturing a gas-barrier film, said method being suited to roll-to-roll production and being capable of manufacturing a gas-barrier film exhibiting excellent gas-barrier performance. The present invention relates to a method for manufacturing a gas-barrier film, said method having: a coating step wherein a first barrier layer formed on a substrate is coated with a polysilazane-containing solution, forming a coating; and a UV-irradiation step wherein a second barrier layer is formed via vacuum-UV irradiation from a light source. From the beginning to the end of said vacuum-UV irradiation, the vacuum-UV irradiance at the surface of the aforementioned coating is at most 160 mW/cm2. There is a period (T) during which the vacuum-UV irradiance at the surface of the coating is between 50 and 160 mW/cm2, inclusive, and the amount of energy received by the surface of the coating during said period (T) is between 180 and 1800 mJ/cm2, inclusive. |
