CVD DEVICE AND CVD METHOD

摘要

The purpose is to provide a plasma CVD device that is capable of improving accumulation speed of carbon film on a substrate for treatment, reducing the frequency of cleaning by reducing accumulation on members other than the substrate for treatment, and being produced inexpensively. The provided CVD device is characterized: by being provided with a vacuum container, a magnetic field formation means for forming a magnetic field within the vacuum container, a plasma generation means for generating plasma within the vacuum container, and a substrate holder for holding a substrate within the vacuum container; and in that the plasma generation means has an electrode provided within the substrate holder, and a power source for applying voltage to the electrode.