发明名称 COPPER PILLAR FULL METAL VIA ELECTRICAL CIRCUIT STRUCTURE
摘要 An electrical interconnect including a first circuitry layer with a first surface and a second surface. At least a first dielectric layer is printed on the first surface of the first circuitry layer to include a plurality of first recesses. A conductive material is deposited in a plurality of the first recesses to form a plurality of first conductive pillars electrically coupled to, and extending generally perpendicular to, the first circuitry layer. At least a second dielectric layer is printed on the first dielectric layer to include a plurality of second recesses generally aligned with a plurality of the first conductive pillars. A conductive material is deposited in a plurality of the second recesses to form a plurality of second conductive pillars electrically coupled to, and extending parallel the first conductive pillars.
申请公布号 US2012168948(A1) 申请公布日期 2012.07.05
申请号 US201213413724 申请日期 2012.03.07
申请人 HSIO TECHNOLOGIES, LLC 发明人 RATHBURN JAMES
分类号 H01L23/498;H01L21/50 主分类号 H01L23/498
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