发明名称 METHOD FOR MANUFACTURING CU WIRE PLATED PD
摘要 PURPOSE: A method for manufacturing a copper wire plated with palladium is provided to implement plating at relatively low current density by repetitively inserting and taking a copper wire in and out of a palladium plating bath. CONSTITUTION: A method for manufacturing a copper wire plated with palladium comprises the steps of: preparing a copper wire(S10), dipping the copper wire in a palladium plating bath(S30), and performing palladium plating on the top of the copper wire through pulse-reverse electroplating comprising a forward current period of 1-100msec and an off current period of 0.1-10msec.
申请公布号 KR20120073899(A) 申请公布日期 2012.07.05
申请号 KR20100135820 申请日期 2010.12.27
申请人 J-MICRON CO., LTD. 发明人 HWANG, HWA IEK;YOU, SUNG KUN;LEE, HA NA;CHOI, YOUNG HEE
分类号 C25D5/18;C25D5/34;C25D5/48;C25D7/06 主分类号 C25D5/18
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