发明名称 |
METHOD FOR MANUFACTURING CU WIRE PLATED PD |
摘要 |
PURPOSE: A method for manufacturing a copper wire plated with palladium is provided to implement plating at relatively low current density by repetitively inserting and taking a copper wire in and out of a palladium plating bath. CONSTITUTION: A method for manufacturing a copper wire plated with palladium comprises the steps of: preparing a copper wire(S10), dipping the copper wire in a palladium plating bath(S30), and performing palladium plating on the top of the copper wire through pulse-reverse electroplating comprising a forward current period of 1-100msec and an off current period of 0.1-10msec.
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申请公布号 |
KR20120073899(A) |
申请公布日期 |
2012.07.05 |
申请号 |
KR20100135820 |
申请日期 |
2010.12.27 |
申请人 |
J-MICRON CO., LTD. |
发明人 |
HWANG, HWA IEK;YOU, SUNG KUN;LEE, HA NA;CHOI, YOUNG HEE |
分类号 |
C25D5/18;C25D5/34;C25D5/48;C25D7/06 |
主分类号 |
C25D5/18 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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