发明名称 METHOD OF COUPLING SEMICONDUCTOR STRUCTURES DIRECTLY TO EACH OTHER, AND COUPLED SEMICONDUCTOR STRUCTURE FORMED BY USING THAT METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide a method of coupling semiconductor structures directly to each other. <P>SOLUTION: A method of coupling semiconductor structures directly to each other is provided. A cap layer can be provided on the interface between the directly coupled metal features of a semiconductor structure. Impurities are provided in the directly coupled metal features of a semiconductor structure. A coupled semiconductor structure is formed using such a method. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012129521(A) 申请公布日期 2012.07.05
申请号 JP20110260461 申请日期 2011.11.29
申请人 SOYTEC 发明人 MARIAM SADAKA
分类号 H01L21/768;H01L21/603;H01L25/065;H01L25/07;H01L25/18 主分类号 H01L21/768
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