发明名称 MEMORY ELEMENT AND MEMORY APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To achieve a magnetic memory using a spin torque which can obtain vertical magnetization in heat treatment at a temperature in a range from about 300&deg;C to 400&deg;C and can be easily manufactured in a semiconductor process. <P>SOLUTION: A memory element comprises a memory layer 17 having magnetization perpendicular to a film surface and a direction of magnetization changed corresponding to information, a magnetization fixed layer 15 having magnetization perpendicular to the film surface, which serves as a reference of information stored in the memory layer 17 and an insulation layer 16 of an oxide provided between the memory layer 17 and the magnetization fixed layer 15. At least one of the memory layer and the magnetization fixed layer is formed such that an Fe film and an Ni-contained film sequentially formed from the side of an interface bordering the insulation layer and a graded composition distribution in which a composition ratio of Fe to Ni on the interface side is larger is formed after heat treatment. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012129225(A) 申请公布日期 2012.07.05
申请号 JP20100276590 申请日期 2010.12.13
申请人 SONY CORP 发明人 OMORI HIROYUKI;HOSOMI MASAKATSU;BESSHO KAZUHIRO;HIGO YUTAKA;YAMANE KAZUAKI;UCHIDA HIROYUKI;ASAYAMA TETSUYA
分类号 H01L27/105;H01L21/8246;H01L29/82;H01L43/08;H01L43/10 主分类号 H01L27/105
代理机构 代理人
主权项
地址